Low pressure horizontal oxidation /annealing system suitable for thermal annealing and thermal activation processes of various solar cell structures, such as PERC, PERT, TOPCon and TBC cells.
Parameter
Uptime98%
Tube I.D 430-480mm
Capacity2400～2880 pcs/tube
Wafer Size Compatible with 182-230 wafer sizes
Temperature600-1050℃
OptionalWater Oxygen Process
Highlights
High capacity with double insert, low costing
Innovative 4 segment thermal field, equipped with ATS system for better temperature control accuracy
Door flange with purge-ring design for longer maintenance cycle
