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Low Pressure Horizontal Placement Boron Diffusion Equipment
Home
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Solar Cell
/ Low Pressure Horizontal Placement Boron Diffusion Equipment
Home
/
Solar Cell
/ Low Pressure Horizontal Placement Boron Diffusion Equipment
Low Pressure Horizontal Placement Boron Diffusion Equipment
Datasheet
Description
Enabling oxidation, BSG growth and Boron diffusion process via thermal and chemical reactions.
Parameter
Uptime
98%
Tube I.D
430 – 480mm
Capacity
2400~2880 pcs/tube
Wafer Size
Compatible with 182-230 wafer sizes
Sheet Resistance non-uniformity
within-wafer & wafer-to-wafer ≤5%;run-to-run ≤4%
Temperature
600 – 1050 °C
Optional
Water Oxygen,online diaphragm pump cleaning
Highlights
High capacity with double loading
Innovative 4 segment heater + ATS system for better temperature control
Door flange with purge-ring design for longer maintenance cycle
New water-cooled furnace door system
New cooling purification area
Fully automatic intelligent control system
One-click temperature auto tuning function
New automatic purge mode to improve pump and consumable parts maintenance cycles
Deposition Result